发明名称 Method of manufacturing a device and group of masks for this method
摘要 A method and group of masks for manufacturing a device whereby illumination of a photoresist layer (4) takes place by subsequent illumination through partial masks (1) and 2). During these separate illuminations, complementary scales of grey are obtained in the connection region (7, 8) of the images (5, 6), the total illumination in the connection region (7, 8) being nevertheless complete. According to the invention, good results are obtained when the partial masks (1) and (2) have complementary transparency gradients in the ends (9, 10) corresponding to the scales of grey.
申请公布号 US5286584(A) 申请公布日期 1994.02.15
申请号 US19920966667 申请日期 1992.10.26
申请人 U.S. PHILIPS CORPORATION 发明人 GEMMINK, JAN W.;GEERTS, WILHELMUS H. M.;DISSEL, MARCEL
分类号 G02F1/1362;G03F1/14;G03F7/20;(IPC1-7):G03C5/00 主分类号 G02F1/1362
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