发明名称 METAL MATERIAL EXCELLENT IN ETCHING PROPERTY
摘要 PURPOSE:To provide a metal material having excellent etching property in which fast etching can be done preferentially in the thickness direction of the sheet by forming a cast structure in at least a part of the metal material and specifying the dislocation density. CONSTITUTION:The metal material has excellent etching property and has a cast structure such as dendrite structure in at least a part of the material and has >=10<2> dl/cm<2>, more preferably 10<4>-10<11>dl/cm<2> dislocation density. In this material, precise etching can be performed. The cast structure is formed by rapid cooling at >=100 deg.C/sec cooling rate by a single roll method or twin roll method and is preferably formed in the surface layer to a thickness about >=1/10 of the sheet thickness. The dislocation density above specified is obtd. by rolling under proper conditions. Thereby, wettability for an etching liquid and mechanical strength of the sheet for etching can be improved.
申请公布号 JPH0641767(A) 申请公布日期 1994.02.15
申请号 JP19920200976 申请日期 1992.07.28
申请人 TOSHIBA CORP 发明人 INABA MICHIHIKO;HIGASHINAKAGAHA EMIKO;MORI FUMIO;FUJIMORI YOSHINORI;OTAKE YASUHISA;OMORI HIROFUMI
分类号 C23F1/00;H01L23/50;(IPC1-7):C23F1/00 主分类号 C23F1/00
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