发明名称 Wafer stage with reference surface
摘要 An electromagnetic sub-stage and an electromagnetic monolithic stage coupled such that one follows the other having a single reference surface positioned therebetween. A sub-stage having linear motors for movement in the X-Y direction is mounted by a U bracket to a monolithic stage. The monolithic stage is suspended by flat electromagnetic coils providing precise motion of the body of the monolithic stage in X, Y, Z, and rotation about the Z axis or (theta). Follow control means links or tracks the movement of the monolithic stage to the sub-stage such that the monolithic stage positioning coils are centered in their respective magnetic structure. Adjustable mechanical stops attached the monolithic stage in combination with air bearings riding on the reference surface limit travel of the monolithic stage in the focus or Z direction. The single reference surface extends over the entire range of motion of the monolithic stage. This improves position accuracy, and cleaning and servicing of the apparatus. The modular nature of the monolithic stage permits easy removal for inspection and repair.
申请公布号 US5285142(A) 申请公布日期 1994.02.08
申请号 US19930015520 申请日期 1993.02.09
申请人 SVG LITHOGRAPHY SYSTEMS, INC. 发明人 GALBURT, DANIEL N.;O'CONNOR, GEOFFREY
分类号 B23Q1/00;B23Q1/62;B23Q5/28;B23Q5/52;B25J9/16;G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G05B11/00 主分类号 B23Q1/00
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