| 摘要 |
This projection imaging system has large-area exposure capability, high exposure throughput, and high resolution, and comprises: (a) a stage for holding in fixed juxtaposition a mask and a substrate, and capable of scanning in one dimension, and when not scanning in that dimension, capable of moving laterally in a direction perpendicular to the scan direction so as to position itself for another scan, the stage exposing the full substrate by breaking up the substrate area into parallel strips, and exposing each strip by scanning the length of the strip across a fixed illumination region; (b) an illumination system having an effective source plane of a predetermined shape, and capable of illuminating on the mask a region of the above predetermined shape; (c) a projection assembly having an object-to-image magnification ratio of unity, having means to render the image in the same orientation as the object, and having an image field of the above predetermined shape and of an area smaller than the substrate area; and (d) provision for additive illumination in overlap regions of areas exposed by adjacent scans such that the effect of the exposure dose delivered in the overlap regions is seamless and the effect of the exposure dose delivered across the entire substrate is uniform.
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