发明名称 |
Electron gun with bi-potential focusing lens and electrostatic deflection plates |
摘要 |
A one-gun three-beam electron gun comprises a triode part controlling an electron source generating a plurality of electron beams and emission of the electron beams generated by the electron source; a main electron lens of bi-potential focusing type consisting of not less than two cylindrical electrodes focusing the plurality of electron beams emitted by the triode part; electrostatic deflection plates disposed on the screen side of the main electron lens; and electrostatic deflection plates disposed on the electron source side of the main electron lens.
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申请公布号 |
US5285130(A) |
申请公布日期 |
1994.02.08 |
申请号 |
US19910668102 |
申请日期 |
1991.03.12 |
申请人 |
HITACHI, LTD. |
发明人 |
TAKAYAMA, SHIGEHIKO |
分类号 |
H01J29/50;H01J29/51;H01J29/62;(IPC1-7):H01J29/74 |
主分类号 |
H01J29/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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