发明名称 Electron gun with bi-potential focusing lens and electrostatic deflection plates
摘要 A one-gun three-beam electron gun comprises a triode part controlling an electron source generating a plurality of electron beams and emission of the electron beams generated by the electron source; a main electron lens of bi-potential focusing type consisting of not less than two cylindrical electrodes focusing the plurality of electron beams emitted by the triode part; electrostatic deflection plates disposed on the screen side of the main electron lens; and electrostatic deflection plates disposed on the electron source side of the main electron lens.
申请公布号 US5285130(A) 申请公布日期 1994.02.08
申请号 US19910668102 申请日期 1991.03.12
申请人 HITACHI, LTD. 发明人 TAKAYAMA, SHIGEHIKO
分类号 H01J29/50;H01J29/51;H01J29/62;(IPC1-7):H01J29/74 主分类号 H01J29/50
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