发明名称 |
LASER SYSTEM, EXPOSURE DEVICE AND EXCIMER LASER |
摘要 |
PURPOSE:To reduce an installation space and a cost of a system by simplifying the system. CONSTITUTION:A laser system has a plurality of lasers 2a-2c necessary for a vacuum evacuation unit for operating a laser oscillator. One vacuum evacuation unit 4 is used commonly for the plurality of the lasers to evacuate the lasers. The evacuations are controlled by communicating with the lasers by a controller. |
申请公布号 |
JPH0629591(A) |
申请公布日期 |
1994.02.04 |
申请号 |
JP19920204284 |
申请日期 |
1992.07.09 |
申请人 |
CANON INC |
发明人 |
SANO NAOTO;YASUFUKU YUJI;OOUCHI CHIGUSA |
分类号 |
G03F7/20;H01L21/027;H01L21/30;H01S3/036;H01S3/104;H01S3/134;(IPC1-7):H01S3/036 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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