发明名称 LASER SYSTEM, EXPOSURE DEVICE AND EXCIMER LASER
摘要 PURPOSE:To reduce an installation space and a cost of a system by simplifying the system. CONSTITUTION:A laser system has a plurality of lasers 2a-2c necessary for a vacuum evacuation unit for operating a laser oscillator. One vacuum evacuation unit 4 is used commonly for the plurality of the lasers to evacuate the lasers. The evacuations are controlled by communicating with the lasers by a controller.
申请公布号 JPH0629591(A) 申请公布日期 1994.02.04
申请号 JP19920204284 申请日期 1992.07.09
申请人 CANON INC 发明人 SANO NAOTO;YASUFUKU YUJI;OOUCHI CHIGUSA
分类号 G03F7/20;H01L21/027;H01L21/30;H01S3/036;H01S3/104;H01S3/134;(IPC1-7):H01S3/036 主分类号 G03F7/20
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