| 摘要 |
PURPOSE:To provide a resistance heating-type heater element, for a multipurpose apparatus for semiconductor manufacturing, and a susceptor, for the multipurpose apparatus for semiconductor manufacturing, which are stable in various atmospheres and to provide the multipurpose apparatus, for semiconductor manufacturing, which is provided with them so that various treatments such as a film-formation treatment, an ecthing treatment and the like can be executed to a semiconductor substrate inside the same apparatus. CONSTITUTION:A resistance heating-type heater element 6 for a multipurpose apparatus for semiconductor manufacturing and a susceptor 5 for the multipurpose apparatus for semiconductor manufacturing are formed of a silicon carbide sintered substance which has been sintered without adding a sintering auxiliary agent, whose sintered- substance density is 2.8g/cm<3> or higher and whose electric resistivity value at room temperature is 1OMEGA.cm or lower. In the multipurpose apparatus for semiconductor manufacturing, the resistance heating-type heater element 6 and the susceptor 5 are installed. |
