| 摘要 |
PURPOSE:To assure the air permeability of a region enclosed with a pellicle, a pellicle frame and a photomask to the outdoor air and to maintain the flatness of the pellicle without degrading mass productivity and entailing the sticking of foreign matter to the photomask and pellicle surface in the production of semiconductor devices using the photomask mounted with the pellicle. CONSTITUTION:At least a part of the flanks of the pellicle frame 12 for mounting the pellicle to the photomask are provided with apertures 14, 15 and these apertures 14, 15 are internally provided with valves 18, 19 used only to allow the advance of the outdoor air into the pellicle and valves 16, 17 used only to allow the emission of the air in the pellicle to the outside. The accuracy of inspecting the foreign matter for the photomask is enhanced and the rupture of the pellicle in an exposure device does not arise any more and, therefore, the mass productivity is improved. |
