发明名称 X-RAY MASK
摘要 PURPOSE:To enhance a positional accuracy of an X-ray mask and to obtain a fresh pattern image by providing an X-ray transmitting membrane containing a diamond microcrystal containing conductive impurity and an X-ray absorber provided along a predetermined pattern on the membrane. CONSTITUTION:After a membrane film 6 for transmitting an X-ray is formed on a silicon substrate 1 through an X-ray reflection preventive film 7, an X-ray absorber 3 in which a fine pattern 3a for semiconductor is formed is formed, and a supporting frame 4 having high rigidity is formed. The membrane 6 is formed of a diamond microcrystal in which boron, etc., is added to exhibit conductivity. Thus, since an X-ray mask having the membrane having high rigidity and conductivity is obtained, the fine pattern is not deviated due to influence of a stress, and decreases in a distortion.visibility due to local charge-up can be prevented even at the time of pattern lithography, circuit inspection, X-ray lithography with an electron beam.
申请公布号 JPH0629193(A) 申请公布日期 1994.02.04
申请号 JP19920183740 申请日期 1992.07.10
申请人 MITSUBISHI MATERIALS CORP;MITSUBISHI ELECTRIC CORP 发明人 KIKUCHI NORIBUMI;YAMASHITA HIROAKI;MATSUI YASUTSUGU;MARUMOTO KENJI;YABE HIDETAKA
分类号 G03F1/22;H01L21/027 主分类号 G03F1/22
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