| 摘要 |
PURPOSE:To provide a photoresist-removing method and a photoresist-removing apparatus wherein the replacement of a stripping liquid by a rinsing liquid can be treated uniformly and with good efficiency by a method and a constitution which are comparatively simple regarding the removing method and the removing apparatus of a photoresist used in a photolithographic method when a pattern is formed in the manufacturing process of a semiconductor device and a liquid-crystal display device. CONSTITUTION:In a first rinsing process 7, a stripping liquid 4 which has dissolved a photoresist is removed after the dissolution treatment by the stripping liquid 4 of a photoresist. In the first rinsing process, the stripping liquid is replaced uniformly and with good efficiency by a rinsing liquid which has been jetted uniformly in a direction opposite to the conveyance direction of a substrate 1 and in the width of the conveyance direction of the substrate. Thereby, the rinsing liquid does not stagnate locally when the stripping liquid is replaced by the rinsing liquid. As a result, a local rinsing defect is eliminated, and a semiconductor device and a liquid-crystal display device whose yield is high and whose reliability is excellent can be manufactured. |
