发明名称 |
DIAZO SENSITIZER OF FLUORINATED ESTER |
摘要 |
PURPOSE: To obtain high heat stability, high radiation stability and high insulating resistance by containing a specified hexafluoro-bis-phenol. CONSTITUTION: A photosensitive composition comprises a resin sensitizer of a reaction product of hexafluoro-bis-phenol represented by formula I or bis- hexafluoroether and diazosulfonyl chloride, such as diazo-L-sulfonyl chloride or diazo-F-sulfonyl chloride extremely compatible with a polyamide having fluorinated and hydroxyl groups. In formulae I and II, R is an H atom or a methyl or ethyl or phenyl group. The solubilities of these photosensitive compositions can be controlled easily by mixing the fluorinated and hydroxylated polyamide with sensitizers having various solubilities. |
申请公布号 |
JPH0627663(A) |
申请公布日期 |
1994.02.04 |
申请号 |
JP19910353453 |
申请日期 |
1991.12.17 |
申请人 |
HOECHST CELANESE CORP |
发明人 |
DEINESHIYU ENU KANNA;ROBAATO II POTOBIN |
分类号 |
C08K3/16;C08L77/00;C08L77/06;G03F7/004;G03F7/016;G03F7/022;G03F7/027;G03F7/029;G03F7/037;G03F7/039;H01L21/027;(IPC1-7):G03F7/029 |
主分类号 |
C08K3/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|