发明名称 PHOTORESIST PROVIDED WITH IMAGE-REVERSING NEGATIVE ACTION
摘要 PURPOSE: To improve preservable stability and storage life by incorporating a specific quantity of a photosensitive compound per the weight of the solid matter in a composition. CONSTITUTION: The photosensitive compound expressed by a formula is contained by about 1-25% by weight of the solid matter in the composition. Further, about 75-99% novella and/or polyvinyl phenol resin by weight of the solid matter and about 0.5-20%, by weight, crosslinking compound capable of crosslinking the resin in a heating condition in the presence of a certain quantity and a certain intensity of an acid generated at the time of exposing an azide with the irradiation of an active ray are contained. In the formula, R1 expresses 1,2benzoquinone-2-diazide-4-sulfonyl or the like, R2 expresses H, R7 , OR6 or C(=0)-R7 , R3 expresses H, R7 , OR6 or C(=0)-R7 , R4 expresses H, R7 , OR6 or C(=0)-R7 , R6 expresses H, an alkyl, an aryl, an alalkyl or R1 and R7 expresses an alkyl, an aryl or alalkyl.
申请公布号 JPH0627654(A) 申请公布日期 1994.02.04
申请号 JP19910149596 申请日期 1991.05.24
申请人 HOECHST CELANESE CORP 发明人 MAAKU EE SUPATSUKU;DONARUDO MAMATO;DANA DARAMU;SANGIA JIYAIN
分类号 G03F7/004;G03F7/022;G03F7/038;G03F7/20;G03F7/38;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/004
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