| 摘要 |
PURPOSE:To prevent the deformation of a pellicle film by a fluctuation in outdoor pressure of the pellicle to be stuck to a photomask used in the process for production of semiconductor devices, etc. CONSTITUTION:The pellicle film 1 in the outer peripheral part of the pellicle is previously reinforced and a reinforced part 8 is provided with a fine hole 7. Other methods include a method of boring a small hole in a pellicle frame 2 and sealing the hole of the pellicle frame 2 with a tape provided with the fine holes at least at one point, a method of providing the pellicle frame 2 with an aperture and sticking an airtight film provided with deflection to the above-mentioned aperture, etc. The difference between the atm. pressures in and out of the pellicle is automatically regulated and the intrusion of the foreign matter at the time of air pressure regulation, etc., is prevented. In addition, the danger of the intrusion of the foreign matter is eliminated and, therefore, the need for the inspection of the foreign matter which is heretofore carried out is eliminated and further, the operation for resticking of the pellicle which is heretofore carried out in the event of the intrusion of the foreign matter and the failure of the pellicle is eliminated. |
