| 发明名称 |
A method for vapor drying. |
| 摘要 |
<p>A multi-directional flow of isopropyl alcohol vapor is used to uniformly dry a semiconductor substrate. In one embodiment of the invention, isopropyl alcohol vapor (19), which is generated by an external vapor source (30), is injected into the vapor drying system at a location near the top portion (28) of the semiconductor substrate (20), while internally generated isopropyl alcohol vapors (18) are directed toward the bottom portion (26) of the semiconductor substrate (20). Therefore, both the top (28) and the bottom (26) portions of the semiconductor substrate (20) are dried at approximately the same time. <IMAGE></p> |
| 申请公布号 |
EP0580980(A1) |
申请公布日期 |
1994.02.02 |
| 申请号 |
EP19930108329 |
申请日期 |
1993.05.24 |
| 申请人 |
MOTOROLA, INC. |
发明人 |
FRANKA, JOHN G.;DEPINTO, GARY A.;FISHER, ROSS;MORGAN, HARRY S. |
| 分类号 |
F26B3/04;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/00 |
主分类号 |
F26B3/04 |
| 代理机构 |
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