发明名称 ALIGNMENT SYSTEM FOR OPTICAL MICRO-LITHOGRAPHY
摘要 <p>PURPOSE: To improve optical signals and to reduce shift of positioning by using a two-dimensional CCD detector array or a photodiode array detector as a confocal filter by a confocal space filter means and using an inverse dark field constitution. CONSTITUTION: The detailed image of an opening less than a resolution, similar to a slit column, is projected on a wafer 27 by using an illumination pupil. A main light beam 21 of illumination goes out from the opening 20 which is less than the resolution and is passed through an opening 23 in an inverse dark field mirror 22. Then, the light beam 21 reaches an object image-forming lens 24, is converged there, is turned into a beam 25, is passed through a mask 26, and reaches the wafer 27. The reflected light of the beam 25 is returned upwards as a beam 32, passed through the lens 24 and reflected from the back surface of the mirror 22 to the right as a beam 33. Then, it is passed through a relay 28, appears as the beam 34 and is passed through a confocal opening 29. Then, it is passed through a relay lens 30, turned into a beam 35 and hits to a detector 31.</p>
申请公布号 JPH0620907(A) 申请公布日期 1994.01.28
申请号 JP19930066899 申请日期 1993.03.25
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 KURISUTOFUAA JIYON PUROGURAA;ARAN EDOWAADO ROOZENBURUUTO
分类号 G02B21/00;G03F7/20;G03F9/00;H01L21/027;H01L21/30;H01L21/68;(IPC1-7):H01L21/027 主分类号 G02B21/00
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