| 摘要 |
<p>PURPOSE:To avert the abnormality in the appearance in a wafer state and the decrease of the effective chips on a silicon wafer by setting the inside diameter of the circular frame of a nitrocellulose film with the circular frame larger than the diameter of the wafer. CONSTITUTION:The center of the silicon wafer 1 is shifted upward half the chip from the center of a glass mask 3 in order to obtain the effective chips on the wafer 1 in a larger number. The inside diameter of the frame 5 of the pellicle installed on the glass mask 3 is set larger than the diameter of the silicon wafer 1. The difference between the inside diameter of the pellicle frame 5 and the diameter of the silicon wafer 1 is at least half the chip or above in such a case and, therefore, the shadow of the pellicle frame 3 installed on the glass mask 3 is not transferred onto the silicon wafer 1. As a result, the decrease in the number of the effective chips by the shadow of the pellicle frame 5 transferred onto the silicon wafer 1 and the abnormality in the appearance of the wafer 1 are eliminated.</p> |
