METHOD OF FORMING DEPOSIT FILM AND OPTICAL ELECTROMOTIVE ELEMENT AND METHOD OF CONTINUOUSLY MANUFACTURING OPTICAL ELECTROMOTIVE ELEMENT

摘要

PURPOSE:To obtain continuously an optical electromotive force element with high quality and excellent uniformity ranging a large area by a method wherein specific microwave energy acts on material gas, whereby high RF energy acts on material gas. CONSTITUTION:Inner pressure within a deposit chamber is set at 0.5 to 50mTorr and microwave energy cast within the chamber to form a deposit film is lower than that necessary for dissolving material gas at 100%. At the same time, RF energy which is higher than this microwave energy is cast. Namely, the instant that the microwave energy is introduced from a wave guide part 110, the RF energy is introduced from a bias power source 111 to the deposit chamber to dissolve the material gas to form a deposited film having a desired layer thickness on a substrate. Thus, a mitigating reaction is accelerated on the substrate surface to obtain the deposited film with good quality.