| 摘要 |
PURPOSE:To improve a shape of a resist pattern to a rectangular shape from a tapered state without reducing a dissolving contrast as much as possible in an acid catalyst chemical amplifying system resist. CONSTITUTION:An acid catalyst series negative resist 105 is irradiated with a light 106, and the resist 105 of a part 106 irradiated with the light by a low temperature PEB process is formed to an insolubilized region 107 by the low temperature PEB process. An insolubilized region 108 by a high PEB process is formed on a boundary between the region 107 and the resist 105 which is not insolubilized. A resist pattern 109 formed in a rectangular shape of the regions 107 and 108 is obtained. |
