发明名称 THERMAL TREATMENT OVEN
摘要 <p>PURPOSE:To obtain a thermal treatment oven which is simple in structure and able to thermally treat works in succession without giving them vibrations. CONSTITUTION:Electrode paste is applied to chip parts, a large number of chip parts are held in a holding plate A, and the holding plate A is transferred into a drying oven 1. Vane frames 37 are radially provided to a rotary body 31 which rotates intermittently around a shaft 30, and a pair of inward holding grooves which hold both the sides of the holding plate A slidable in the axial direction of the shaft 30 is provided to each of the vane frames 37. The holding plate A transferred to an inlet/outlet by a conveyer is inserted into the holding grooves by a loading arm. Heating zones are provided inside the oven 1, and the electrode paste is dried up while the rotary body 31 is rotated by a single turn.</p>
申请公布号 JPH0620894(A) 申请公布日期 1994.01.28
申请号 JP19930044656 申请日期 1993.02.08
申请人 MURATA MFG CO LTD 发明人 HATA YOSHITAKA;KUGA TETSUYA;KURIHARA HIDEKAZU;KOGAME TOSHIHIKO
分类号 F26B15/00;H01C17/00;H01C17/28;H01G13/04;(IPC1-7):H01G13/04 主分类号 F26B15/00
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