| 摘要 |
<p>PURPOSE:To prevent the delay of signals and to make a display device larger in size and higher in fineness by patterning transparent conductive films to form pixel electrodes, then forming signal lines. CONSTITUTION:The transparent conductive films essentially consisting of indium oxide to constitute the pixel electrodes 15 and additive capacity electrodes 16 are laminated, the films are patterned by photolithography to form the pixel electrodes 15 and the additive capacity electrodes 16. In succession, aluminum contg. <=15% high melting metal is then laminated and is patterned by photolithography, by which signal lines 14, source electrodes 29 and drain electrodes 27 of TFTs 20 are formed. The signal lines 14, etc., are formed after the pixel electrodes 15, etc., are formed by patterning the transparent conductive films in such a manner and, therefore, there is no need for considering the influence of an etching liquid, etc., at the time of patterning the transparent conductive films. The use of an aluminum alloy which is lower in resistance than titanium is thus possible. Consequently, the delay of the signals in the signal lines 14 is prevented.</p> |
