发明名称 PRODUCTION OF SCRATCHING RESISTANT BASE MATERIAL HAVING ANTIREFLECTION PROPERTY, SCRATCHING RESISTANT BASE MATERIAL AND POLARIZING PLATE
摘要 PURPOSE:To provide the scratching resistant base material constituted by forming antireflection coating films which are hard cured coating films, have scratching resistance and good ray transmittance, can be easily produced and has good adhesion between the layers on the surfaces of a transparent base material, the polarizing plate formed by using such scratching resistant base material and the process for production thereof. CONSTITUTION:Lower layer coating films 2 are formed on one or both surfaces of the transparent substrate 1 by applying a resin compsn. contg. a ionization radiation curing type resin thereon. A thermoplastic resin or thermosetting resin may be incorporated into this resin compsn. The coating films 2 are half cured and the ionization radiation curing type resin having the refractive index slightly lower than the refractive index of the coating films 2 is applied thereon to form upper layer coating films 3. Both the coating films 2, 3 are simultaneously cured by irradiating the films with ionization radiations, by which the scratching resistant base material is obtd. This scratching resistant base material may be provided with moistureproof layers. The polarizing plate is obtd. by laminating this scratching resistant base material on a polarizing element.
申请公布号 JPH0618704(A) 申请公布日期 1994.01.28
申请号 JP19920314592 申请日期 1992.11.25
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAMURA NORINAGA
分类号 C08J7/04;G02B1/10;G02B5/30 主分类号 C08J7/04
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