发明名称 ELECTRONIC DEVICE PROVIDED WITH METALLURGY CONTAINING COMPOUND OF COPPER AND SEMICONDUCTOR
摘要 PURPOSE: To replace a structural material for forming an electric mutual connection with a semiconductor chip for an inexpensive substitute for gold by providing a metallurgical structure, including a material containing silicon and germanium. CONSTITUTION: For example, it is desired that a pad is provided with surface metallurgically wetted by solder for bonding, so that a chip with solder mound such as C4 can be connected with a substrate like the pad on a package substrate. Then, a passivation state layer 8 constituted of an organic material or an inorganic material is formed in the surrounding of an electric conductor 4 made of an Al/Cu material, while an exposed region 10 of the electric conductor 4 is left. A layer constituted of a material 12, including silicon or germanium, is arranged on the passivation state layer 8 so as to be brought in contact with the exposed region 10. Thus, aluminum oxide or copper oxide can be removed from the surface of the contact pad, the increase in a contact resistance can be suppressed, and Cu can be prevented from being dispersed in a silicon substrate 2.
申请公布号 JPH0621140(A) 申请公布日期 1994.01.28
申请号 JP19930058439 申请日期 1993.03.18
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 MAIKERU JIYON BURADEII;KAACHISU EDOWAADO FUARERU;SUN KUON KAN;JIEFURII ROBAATO MARINO;DONARUDO JIYOOZEFU MIKARUSEN;POORU ANDORIYUU MOSUKOUITSUTSU;YUUJIN JIYON OSARIBAN;TERENSU ROBAATO OTOUURU;SANPASU PURUSHIYOTAMAN;SHIERUDON KOORU RIIREI;JIYOOJI FUREDERITSUKU UOOKAA
分类号 H01L21/60;C23C18/50;C25D3/54;H01L21/288;H01L21/603;H01L21/768;H01L23/495;H01L23/498;H01L23/532 主分类号 H01L21/60
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