发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 <p>PURPOSE:To surely support wafers in a stable state, to eliminate danger that the wafer falls from a port and to enhance the productivity of the apparatus by installing a side body wherein a plurality of support plates supporting and holding the bottom face of the wafer are arranged and installed in the up-and- down direction in a state that they are isolated in parallel to each other. CONSTITUTION:A cylindrical side pole 3 is installed on a disk-shaped pedestal 4 so as to be perpendicular to the pedestal 4. A plurality of wafer support plates 2 protrude from the side pole to a direction perpendicular to the up-and- down direction of the side pole 3; they are arranged and installed to be comb- shaped in a state that they have been isolated in parallel to each other. Each support plate 2 is a plate shape whose one end away form the side pole 3 has a round shape; each wafer support face 2A supporting the bottom of a wafer is provided with approximately a size (an area) which can surely support the bottom of the wafer over a wide range and in a wide and stable state. When the wafer is set on a port, it does not require any fine adjustment as well as its deformation, its fall and its damage are reduced when it is heat-treated at a high temperature such as diffisuion-treated, oxidation-treated or the like for many hours in a vertical-type furnace.</p>
申请公布号 JPH0621201(A) 申请公布日期 1994.01.28
申请号 JP19920177052 申请日期 1992.07.03
申请人 KAWASAKI STEEL CORP 发明人 ONODA YASUO
分类号 H01L21/22;H01L21/31;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 H01L21/22
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