END-POINT JUDGMENT METHOD OF LITHOGRAPHIC DEVELOPMENT

摘要

PURPOSE: To provide a method for judging the development end-point of resist, X-ray exposed by optically inspecting a test region at the time of resist development. CONSTITUTION: A test region 36 of the resist 20 is X-ray exposed through a mask 40, provided with an attenuator for attenuating an X-ray 50 at plural different levels in a test field 44. The pattern of the resist test region 36 is visually observed through a microscope during a development step. Since the positions of the test region 36 simultaneously receive different radiation amounts respectively, the pattern of the test region 36 changing, corresponding to development time is formed. When the changing pattern of the test region 36 matches with a known pattern related to a desired development end point, a work is excluded from the development step.