Verfahren zur Herstellung einer invertierten Halbleiteranordnung vom Typ silicon-on-insulator mit einer Podeststruktur.,申请号DE19883886291-传众专利搜索

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发明名称	Verfahren zur Herstellung einer invertierten Halbleiteranordnung vom Typ silicon-on-insulator mit einer Podeststruktur.
摘要
申请公布号	DE3886291(D1)	申请公布日期	1994.01.27
申请号	DE19883886291	申请日期	1988.06.16
申请人	MOTOROLA, INC., SCHAUMBURG, ILL., US	发明人	KOURY, DANIEL N., JR., ITHICA NEW YORK 14850, US
分类号	H01L21/20;H01L21/02;H01L21/331;H01L21/336;H01L21/762;H01L21/84;H01L27/12;H01L29/73;H01L29/732;H01L29/78;H01L29/786;(IPC1-7):H01L21/84	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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