发明名称 Excimer laser processing method and apparatus.
摘要 An excimer laser ablation processing for forming via holes in a resin film by irradiation of an excimer laser wherein, the emission of light caused during the decomposition of the resin during the processing is detected, its intensity is measured, and the endpoint of the processing is judged or a comparison is made of the positions of light emission and the design positions for processing to examine for the presence of defects. Provision is made of a means for measuring the intensity and a means for judging the endpoint of the processing from the changes in the intensity of light emission during the processing. <IMAGE>
申请公布号 EP0580408(A1) 申请公布日期 1994.01.26
申请号 EP19930305698 申请日期 1993.07.20
申请人 FUJITSU LIMITED 发明人 YAMAGISHI, YASUO;SHIMIZU, KANAE;MIZUTANI, DAISUKE;OWADA TAMOTSU;ISHIZUKI, YOSHIKATSU;HASHII, HIDEYA
分类号 B23K26/00;B23K26/03;B23K26/06;B23K26/38;B23K26/40;B23K101/42;H01L21/768;H01L23/522;H05K1/02;H05K3/00 主分类号 B23K26/00
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