| 发明名称 |
Gas plasma treatment of plant seeds |
| 摘要 |
Crop yields are improved by treatment of the plant seeds in a low temperature plasma discharge generated between spaced apart electrodes connected to a source of high frequency electrical power.
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| 申请公布号 |
US5281315(A) |
申请公布日期 |
1994.01.25 |
| 申请号 |
US19920959420 |
申请日期 |
1992.10.13 |
| 申请人 |
PLASMA PLUS |
发明人 |
KRAPIVINA, SVETLANA A.;FILIPPOV, ALEXANDER K.;LEVITSKAYA, TATIANA N.;BAKHVALOV, ANDREI |
| 分类号 |
H05F3/04;(IPC1-7):H05F3/00 |
主分类号 |
H05F3/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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