发明名称 Charged particle beam exposure apparatus
摘要 A column section is disposed within a thermostatic chamber within a clean room, a section for analog controlling each portion of the column section is disposed within the clean room and outside of the thermostatic chamber, and a section for digital controlling the analog control section is disposed outside of the clean room.
申请公布号 US5281827(A) 申请公布日期 1994.01.25
申请号 US19910763145 申请日期 1991.09.20
申请人 HITACHI, LTD.;HITACHI INSTRUMENT ENGINEERING CO., LTD. 发明人 KAWANO, MASAMICHI;OKUMURA, MASAHIDE;YODA, HARUO;SHIBATA, YUKINOBU;KONISHI, TADAO
分类号 H01L21/30;H01J37/302;H01J37/317;H01L21/027;(IPC1-7):H01J37/302 主分类号 H01L21/30
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