| 摘要 |
<p>PURPOSE:To provide an industrial method for removing a trace-amount of gaseous impurities such as nitrogen, oxygen, carbon dioxide or the like containing in an inert gas and capable of reducing a cost for gas purification by increasing utilization efficiency of a packing material. CONSTITUTION:The packing material is obtained by forming a thin film of a polycrystalline metal such as titanium or zirconium by PVD method on an inorganic porous base material such as alumina. The packing material is brought into contact with the inert gas containing the trace amount of the gaseous impurities such as nitrogen, oxygen or carbon dioxide at 100-300 deg.C.</p> |
