发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREOF |
摘要 |
The semiconductor memory device has a cell array and a peripheral circuit. Source and drain impurity diffusion regions of transistors constituting the cell array have an impurity concn. lower than that of source and drain impurity diffusion regions of transistors constituting the peripheral circuit. Transistor breakdown voltage in cell array is improved. Data inverting problems and refresh characteristic deterioration due to transistor current leakage in peripheral circuit are solved.
|
申请公布号 |
KR940000510(B1) |
申请公布日期 |
1994.01.21 |
申请号 |
KR19910004394 |
申请日期 |
1991.03.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, KYU - PIL;PARK, YONG - JIK;KIM, JONG - BOK |
分类号 |
H01L27/10;H01L21/8242;H01L27/108;(IPC1-7):H01L27/10 |
主分类号 |
H01L27/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|