| 摘要 |
PURPOSE:To obtain a method capable of simply and surely etching back an X-ray mask in a process. CONSTITUTION:An X-ray mask 100 in a process is stacked on a soft packing 12 of a flat plane type wherein a hole is formed in the central part, in the manner in which the pattern forming side faces downward. A soft packing 12 similar to the soft packing 12 is stacked on the mask 100. Part members 13, 14 having holes are stacked on the packing 12. A recessed part formed by the soft packing 12 on the X-ray mask 100 and the part members 13, 14 having holes is filled with etching liquid 20 of silicon, thereby perfoming etching- back. |
