发明名称 DICING METHOD AND DICING APPARATUS
摘要 <p>PURPOSE:To ensure long life of a blade and keep slight chipping of wafer by preventing uneven wearness of blade (phenomenon where the center area is recessed) due to uneven cooling of the dicing blade in a semiconductor waver dicing method and dicing apparatus. CONSTITUTION:A blade is cooled by supplying the cooling water of normal temperature to the periphery of the side surface of blade from the side surface nozzle 4 arranged in the proximity to both side surfaces of a blade and supplying the low temperature cooling water to a plurality of positions of the external circumferencial surface of the blade from the external circumferencial surface nozzle 15 which has a plurality of injection holes and arranged in the proximity of the external circumference of the blade.</p>
申请公布号 JPH0613460(A) 申请公布日期 1994.01.21
申请号 JP19920166477 申请日期 1992.06.25
申请人 FUJITSU LTD 发明人 YAMADA YUTAKA
分类号 B28D7/02;H01L21/301;H01L21/78;(IPC1-7):H01L21/78 主分类号 B28D7/02
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