| 摘要 |
<p>A method and apparatus of low temperature, deposition of transparent, dielectric films on polymers is disclosed. In particular, an excimer laser beam (20) is irradiated upon a target material (6) such that the target material is ablated. This ablated material creates a vapor plume (22) which contacts a heated polymer substrate (18) located at a predetermined distance away from the target material and forms a dielectric film on the substrate.</p> |
