CURING SILICON HYDRIDE CONTAINING MATERIALS BY EXPOSURE TO NITROUS OXIDE

摘要

CURING SILICON HYDRIDE CONTAINING MATERIALS BY EXPOSURE TO NITROUS OXIDE The present invention relates to a low temperature method of forming silica-containing ceramic coatings on substrates. The method involves applying a coating comprising a silicon hydride containing resin on a substrate and heating the coated substrate under an environment comprising nitrous oxide at a temperature sufficient to convert the resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.