MANUFACTURE OF THIN FILM SEMICONDUCTOR SUBSTRATE,申请号JP19920156461-传众专利搜索

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发明名称	MANUFACTURE OF THIN FILM SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH065484(A)	申请公布日期	1994.01.14
申请号	JP19920156461	申请日期	1992.06.16
申请人	SEIKO EPSON CORP	发明人	IWAMATSU SEIICHI
分类号	H01L21/02;H01L27/12;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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