| 摘要 |
PURPOSE:To eliminate adhesiveness, to enhance sensitivity to ultraviolet rays, and to restrain polymerization hindrance due to oxygen in the air by incorporating a specified resin, an organic peroxide incorporating an aromatic group, and a specified compound. CONSTITUTION:This composition consists of (A) the resin obtained by allowing an isocyanate compound having an unsaturated group to react with a novolac type epoxy resin having a secondary amine added, (B) the organic peroxide having an aromatic group, and (C) bis(dialkylamino)benzophenone. A substrate is coated for example, by electrodeposition coating with the coating fluid obtained by dispersing and/or dissolving this composition in water by using the amino group incorporated in the resin (A). A desired image is formed by drying the coating film and exposing and developing it, thus, permitting the obtained composition to be high in sensitivity to ultraviolet rays and free from polymerization hindrance due to oxygen in the air even if the film is as thin as <=10mum at the time of photopolymerization, and to be superior in storage stability and free from adhesiveness. |
