| 摘要 |
PURPOSE:To calculate contrast and exposure light intensity distribution of projection exposure by a slant incidence illumination system, in addition to the conventional projection exposure system, by calculating contrast or average exposure light intensity while changing the spatial frequency of a mask under arbitrary light source conditions and arbitrary entrance pupil conditions. CONSTITUTION:A function J(ks) expressing the shape and the intensity distribution of a light source is set. A function K(k) expressing the shape, the transmittance distribution and the phase distribution of a pupil filter is set. By integrating an arbitary defocusing amount over the ks space, the contrast and the normalized average exposure light intensity are obtained. Thereby the light source condition and the entrance pupil condition which are required by a slant incidence illumination system can be arbitrarily set as simulation conditions, in addition to the optical conditions of the conventional projection exposure system. |
