| 摘要 |
PURPOSE: To form a micromechanics member, in which the compatibility of silicon nitride film is ensured by constituting the surface of at least one silicon wafer with silicon nitride. CONSTITUTION: A sensor is assembled by three silicon plates 1, 2, and 3. A spiral spring 7 and a seismo-type mass part 6 that is suspended on it are structured from a central silicon plate 2. The upper silicon plate 1 is covered with a film 5, where a surface that is directed toward the central silicon plate 2, is made of silicon oxide and a film 4 that is made of silicon nitride. The lower silicon plate 3 is made of silicon only. The central silicon plate 2 is also structured by the films 5 and 4. The combination of these is performed by chemical pretreatment, lamination, and heating. The chemical pretreatment is performed by dipping into a solution of NH4 OH/H2 O2 /H2 O, washing, drying, and heating. The central silicon plate 2 is connected to the silicon surface of the silicon plate 3 and the silicon nitride surface of the silicon plate 1. |
