发明名称 |
PUMPING SYSTEM |
摘要 |
A gas line pumping system of a dry etching process includes a vacuum generator having an inlet thereof connected onto a gas supply line connected between a gas bomb and an etch chamber for supplying gas used for etching, and an outlet thereof connected between a vacuum pump and a gas cleaning unit to form a tubed path by means of a pipe, so that, if the gas accumulates for a long time after completing the etching, the accumulated gas is exhausted to prevent corrosion or clogging phenomena within the line caused by liquefaction of the gas.
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申请公布号 |
KR940000209(B1) |
申请公布日期 |
1994.01.12 |
申请号 |
KR19910018888 |
申请日期 |
1991.10.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JO, IN - SU;PARK, SONG - WON |
分类号 |
F04B23/00;(IPC1-7):F04B23/00 |
主分类号 |
F04B23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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