发明名称 PUMPING SYSTEM
摘要 A gas line pumping system of a dry etching process includes a vacuum generator having an inlet thereof connected onto a gas supply line connected between a gas bomb and an etch chamber for supplying gas used for etching, and an outlet thereof connected between a vacuum pump and a gas cleaning unit to form a tubed path by means of a pipe, so that, if the gas accumulates for a long time after completing the etching, the accumulated gas is exhausted to prevent corrosion or clogging phenomena within the line caused by liquefaction of the gas.
申请公布号 KR940000209(B1) 申请公布日期 1994.01.12
申请号 KR19910018888 申请日期 1991.10.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JO, IN - SU;PARK, SONG - WON
分类号 F04B23/00;(IPC1-7):F04B23/00 主分类号 F04B23/00
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