| 摘要 |
A process for the removal of thermally-stable contaminants from stack gas scrubbing amines using a continuous countercurrent ion exchange column. Amines contaminated after use in stack gas scrubbing are fed into the column containing an anion exchanger resin where the contaminants are sorbed on the resin. The amine is washed from the resin with hot water and is removed from the column. The resin is then pulsed to move the resin with the sorbed contaminants into a elution section of the column. The contaminants are removed using an eluant of sodium hydroxide solution, preferably containing chlorine to enhance elution of thiocyanate ion. A water wash removes traces of the hydroxide solution and any reaction products, and then the resin is again pulsed so as to be moved for reuse. The amines are regenerated with only the single type resin (preferably Type I) and with significantly reduced quantity of reagents.
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