Substrate conveying apparatus

摘要

A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.