Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12

摘要

A developer liquid for image-wise exposed radiation sensitive compositions comprises ethyl hexyl sulphate, a surfactant, and alkaline material such that the pH is al least 12 and preferably at least 13.5. The developer liquid may additionally include a water soluble carboxylic acid salt such as sodium octanoate and the sodium salt of ethylene diamine tetra acetic acid. Such developer liquids can be formulated for use with both positive-working and negative-working compositions.