发明名称 Method for depositing pure metal halide compositions
摘要 Metal halide compositions of enhanced purity are produced by vapor phase deposition via reactions involving organometallic starting materials in a process wherein a carbon getter is provided in the reaction zone and/or adjacent the developing metal halide deposit. The carbon getter reduces carbon contamination in the product which can result from side decomposition reactions involving the organometallic starting materials.
申请公布号 US5277889(A) 申请公布日期 1994.01.11
申请号 US19850733203 申请日期 1985.05.13
申请人 CORNING INCORPORATED 发明人 POWER, JOSEPH M.;SARHANGI, AHMAD
分类号 C01B9/00;C01F7/50;C03C1/00;(IPC1-7):C01B9/00 主分类号 C01B9/00
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