发明名称 |
Method for depositing pure metal halide compositions |
摘要 |
Metal halide compositions of enhanced purity are produced by vapor phase deposition via reactions involving organometallic starting materials in a process wherein a carbon getter is provided in the reaction zone and/or adjacent the developing metal halide deposit. The carbon getter reduces carbon contamination in the product which can result from side decomposition reactions involving the organometallic starting materials.
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申请公布号 |
US5277889(A) |
申请公布日期 |
1994.01.11 |
申请号 |
US19850733203 |
申请日期 |
1985.05.13 |
申请人 |
CORNING INCORPORATED |
发明人 |
POWER, JOSEPH M.;SARHANGI, AHMAD |
分类号 |
C01B9/00;C01F7/50;C03C1/00;(IPC1-7):C01B9/00 |
主分类号 |
C01B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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