发明名称 PROCESS FOR REGULATING A HOT CATHODE GLOW DISCHARGE
摘要 <p>A process is disclosed for regulating a hot cathode glow discharge for plasma polymerising a monomer vapour of organic compounds, preferably of a silicium-organic substance. At first a noble gas is introduced in the vacuum chamber (1), then a predetermined hot cathode current is set and slowly readjusted until a first glow potentiel U1 is attained as a set value. The monomer vapour is then introduced and a second constant glow potential U2 is maintained by slowly readjusting the hot cathode current. This process considerably slows down ageing of the hot cathode and increases its service life. In particular, the variations in the sedimentation rate found in the state of the art are suppressed and the homogeneity and quality of the deposited layer are clearly improved.</p>
申请公布号 WO1994000867(A1) 申请公布日期 1994.01.06
申请号 DE1993000544 申请日期 1993.06.22
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