Plasma etching device for semiconductor disc - has strip line resonator providing electromagnetic field in which semiconductor disc is positioned

摘要

The plasma etching device has a reaction chamber (1) with a gas inlet (2) and a pump connection (3), enclosing a strip line resonator (4,5,8) coupled to a HF supply for providing an electromagnetic field in which the semiconductor disc (9) is located. The strip line resonator has a strip line (4) and an opposing parallel metal surface (8), with the semiconductor disc located between them. The lateral measurement of the strip line parallel to the metal surface is greater than the distance between them. The strip line is coupled to earth via a tuning element (5) e.g. a variable capacitor. ADVANTAGE - Simple and compact arrangement. Magnetic field compacts plasma so that pressure can be reduced. Very homogenous spatial magnetic field between stripline and metal surface.