Selected novolak resin planarization layer for lithographic applications

摘要

A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising: (1) applying thereover a coating of a planarizing coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and (2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.