发明名称 Laser source for photon irradiation through multiple waves - uses series of short impulses lasting microseconds with single impulses lasting nanoseconds to clean materials
摘要 The laser impulses are in the range 10 to 1000 kilohertz and the wavelengths of the laser are adapted to photon absorption on materials e.g metals, and crystalline or vitreous crystals used on historic monuments, pictures, glass objects and will remove foreign bodies or parasites deposited in the course of time. The number of impulses allow an elastic interaction and will eradicate foreign bodies layer-by-layer. The laser source is a matrix of aluminium oxide doped with ions of neodymium and produces a wavelength of 1.064 nanometres with a fundamental frequency of 30 hertz and has a duration of between 7 and 25 nanoseconds. The energy per impulse is between 50 and 1000 millijoules. A matrix of sapphire doped with chromium ions or titanium ions emits at 1.54 microns to 1.8 microns. The apparatus is controlled by an operator and has a push-button to interrupt the laser beam. USE - Cleaning of objects using controllable laser beam with high-energy pulses.
申请公布号 FR2692822(A1) 申请公布日期 1993.12.31
申请号 FR19920007948 申请日期 1992.06.25
申请人 BM INDUSTRIES 发明人 TRETON JEAN-PIERRE;RIBOULET GILLES;BRASSART GILLES
分类号 B08B7/00;B23K26/36;(IPC1-7):B08B7/00;H01S3/00 主分类号 B08B7/00
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