发明名称 |
SHORT CHANNEL VVMOSSFET |
摘要 |
PURPOSE:To reduce the operating resistance of a short channel V-MOS-FET without increasing the area of the chip by shortening the channel length without decreasing the punch through withstand voltage thereof. CONSTITUTION:A semiconductor region 8 having the same conducting type as an n<+>type low specific resistance layer substrate 1 and substantially equal specific resistance thereto is formed at the projected region disposed at the n<+>type low specific resistance layer substrate 1 side of the groove formed to reach the substrate 1 through the substrate 1 and a channel forming layer 2. When the projected height of the region 8 and the width thereof are set at suitable values, it can set the short channel length between the source and the drain without decreasing the punch through withstand voltage thereof. |
申请公布号 |
JPS55121679(A) |
申请公布日期 |
1980.09.18 |
申请号 |
JP19790028233 |
申请日期 |
1979.03.13 |
申请人 |
NIPPON TELEGRAPH & TELEPHONE;NIPPON ELECTRIC CO |
发明人 |
SHIMADA YUUKI;SATOU HIDEYOSHI;ICHIKAWA TETSUO;HIDESHIMA KENJI |
分类号 |
H01L29/417;H01L21/8247;H01L29/08;H01L29/78;H01L29/788;H01L29/792 |
主分类号 |
H01L29/417 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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