摘要 |
PURPOSE:To eliminate a bend of a charged beam or the spread of a charged beam due to a leakage charge in the beam by a method wherein when a pattern is formed with the charged beam, a conductive cover for covering the end surface part of the upper part of a glass substrate with a metal film or the like having a conductivity is provided. CONSTITUTION:A metal film 2 is formed on a glass substrate 3 and the substrate 3 is pushed up by springs 7 and comes into contact with glass substrate control plates 4 provided on the upper surface of a cassette 6. The cassette 6 is pushed up by springs or the like, comes into contact with cassette control plates 5 provided on an aligner and a conductive cover 1 is connected to the point part of the cassette control plate 5. An origin mark 8 is used when an adjustment of a beam and the state of an exposure are confirmed. The cover 1 is mounted in such a way as to cover completely the end part, which is positioned on the side of the mark 8, of the substrate 3. Thereby, a leakage charge in the beam is not reached the end part of the substrate 3 and a defect to cause a problem on accuracy of a bend of the beam is eliminated. |