| 摘要 |
<p>PURPOSE:To enable a substrate cleaning device comparatively compact in struc ture to remove even submicron contaminants high in throughput. CONSTITUTION:A substrate cleaning device is composed of scrubbing members 15A and 15B which come into direct surface-contact with a substrate 9, ultrasonic vibrators 14A and 14B which vibrate the scrubbing members 15A and 15B, drive arms 13A and 13B which periodically swing the scrubbing members 15A and 15B along the surfaces of the substrate 9, and spray nozzles 17A and 17B which spout calcareous water 18 against the substrate 9.</p> |
